Jonas Heitland

Jonas Heitland

Jonas Heitland

Student / Programme Doctorate at D-CHAB

ETH Zürich

Lab. für Physikalische Chemie

HCI F 209

Vladimir-Prelog-Weg 1-5/10

8093 Zürich

Switzerland

Additional information

Jonas Heitland received his BSc in Chemistry from Göttingen University (2020) and an MSc from University College London (2021) before moving to ETH Zurich (2021), where he is currently pursuing his PhD as a research assistant in the lab of Prof. Dr. Ruth Signorell. His research interests include the spectroscopic investigation of aerosols and nanoplasmas using ultrafast laser pulses to study their electronic structure, light-induced dynamics and finite-size effects. His current project revolves around UV photoelectron spectroscopy of organic and inorganic solutes in water droplets to study the valence electronic structure of aqueous solutions of biological and atmospheric relevance.

Publications (new to old)

  1. J. Heitland, J. C. Lee, L. Ban, G. L. Abma, W. G. Fortune, H. H. Fielding, B. L. Yoder and R. Signorell, "Valence electronic structure of interfacial phenol in water droplets", J. Phys. Chem. A 2024, 128, 7396–7406, DOI: 10.1021/acs.jpca.4c04269
  2. N. A. Lau, D. Ghosh, S. Bourne-Worster, R. Kumar, W. A. Whitaker, J. Heitland, J. A. Davies, G. Karras, I. P. Clark, G. M. Greetham, G. A. Worth, A. J. Orr-Ewing, H. H. Fielding, "Unraveling the Ultrafast Photochemical Dynamics of Nitrobenzene in Aqueous Solution", J. Am. Chem. Soc. 2024, 146, 10407–10417, DOI: 10.1021/jacs.3c13826
  3. L. Ban, H. Tang, J. Heitland, C. W. West, B. L. Yoder, I. Thanopulos and R. Signorell, "Ion imaging of spatially inhomogeneous nanoplasmas in NaCl particles", Nanoscale 2024, 16, 5695–5705, DOI: 10.1039/D3NR06368B.
  4. D. Becker, J. Heitland, P. T. M. Carlsson, J. Elm, T. Olenius, S. Tödter, A. Kharrazizadeh, T. Zeuch, "Real-time monitoring of aerosol particle formation from sulfuric acid vapor at elevated concentrations and temperatures", Phys. Chem. Chem. Phys. 2022, 24, 5001–5013, DOI: 10.1039/D1CP04580F.

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